NiCr 80: 20 wt feem pua sputtering lub hom phiaj
Nickel Chromium sputtering lub hom phiaj (NiCr 80: 20wt feem pua) NiCr (80: 20wt feem pua), Ni80Cr20, NiCr8020, NiCr80/20wr feem pua
Purity: 99.5 feem pua (2N5)
Dimension(mm): Thickness 16(plus /-0.1) x Dav 170(plus /{4}}.5) x Length 2050/2300mm, lwm qhov loj me raws li kev cai
Resistance (μΩ.m):>140
Lub zog kawg (Ntau dua lossis sib npaug rau MPa): 440
Elongation (Ntau dua lossis sib npaug rau feem pua): 20 feem pua
Puab: phaj, raj
Relative Density:>=99.7 feem pua
Cov txheej txheem: forging thiab machining
Nto: Hlau xim thiab ci psurface Ra1.6
Flatness: 0 15-0.2 hli
Khoom Taw qhia
NiCr 80: 20 wt feem pua sputtering lub hom phiaj yog tsim los ntawm 80 feem pua nickel thiab 20 feem pua chromium. Nws yog ib hom phiaj siv hauv lub cev vapor deposition (PVD) cov txheej txheem, tshwj xeeb tshaj yog nyob rau hauv cov txheej txheem sputtering. Nws yog feem ntau siv rau hauv ntau daim ntawv thov, suav nrog kev tsim cov yeeb yaj kiab nyias nyias, cov khoom siv hluav taws xob, thiab cov txheej txheem corrosion-resistant. Lawv muaj los ntawm ntau lub tuam txhab thiab cov chaw muag khoom uas tshwj xeeb hauv sputtering lub hom phiaj thiab cov ntaub ntawv muaj feem xyuam.
Cov ntaub ntawv dav dav
Khoom siv: NiCr (80: 20wt feem pua), Ni80Cr20, NiCr8020, NiCr80/20
Purity: 99.5 feem pua (2N5) - 99.95 feem pua (3N5)
Dimension(mm): Thickness 16(plus /{1}}.1) x Dav 170(ntxiv /{4}}.5) x Length 2050/2300mm tsis muaj splicing Los yog raws li qhov xav tau
Daim ntawv thov ntawm Nickel Chromium Sputtering Targets (NiCr 80: 20wt feem pua Tom ntej)
1. architectural iav, tsheb siv iav, graphic zaub teb
2. hluav taws xob thiab semiconductor teb
3. kho kom zoo nkauj thiab pwm teb
4. optics txheej cov ntaub ntawv
| Hom phiaj | Kev tsim khoom Cov txheej txheem | Purity | Qhov ntom | Loj Loj | Ntau lawm Specification | Daim ntawv thov |
Kev tsim khoom Cov txheej txheem | Melting forging | 2N5-3N5 | 8.4 | >100μm | Planar Rotary Raws li tus neeg siv khoom kos duab | Zaj duab xis txheej iav Widow Lens Yas kho kom zoo nkauj |
Parameter ntawm NiCr (80: 20wt feem pua)
Lub npe | Cov tshuaj lom neeg loj feem wt feem pua | Cheebtsam siv max kub | Melting Taw tes | Kev tiv thaiv μΩ·m,20 | Txuas ntxiv tus nqi feem pua | Tshwj xeeb Thaum tshav kub kub J/g. | Kub Kev coj ua Coefficient KJ/Mh | Tawm nthuav dav coefficient aX10-6/ | Microstructure | Sib nqus | ||
Nim plus Co | Cr | Fe | ||||||||||
Ni80 Cr 20 | bal | 20-23 | Tsawg dua los yog sib npaug 1.0 | 1200 | 1400 | 1.09±0.05 | 20 | 0.440 | 60.3 | 18.0 | Austenitic | Tsis-magnetic |
Lwm Cov Hlau Sputtering lub hom phiaj
Magnetron sputtering phiaj, / tig lub hom phiaj (tube phiaj) | |||||
Yam khoom | kev huv | Qhov ntom | puab | Qhov Loj (mm) | Daim ntawv thov |
TiAl sib | 2N8- 4N | 3.6-4.2 | Tube, disc, phaj | OD 70 x T 7 x L Lwm yam raws li customized | Rau cov vaj huam sib luag tiaj tiaj qhia cov hom phiaj, tsho tiv no tsom iav kev lag luam (xws li iav architectural, automotive iav, optical iav) lub hom phiaj, nyias zaj duab xis hnub ci kev lag luam lub hom phiaj, Nto engineering (decorative thiab cov cuab yeej) nrog lub hom phiaj, tsheb headlight coated nrog lub hom phiaj |
Cr phiaj | 2N7-4N | 7.19 | Tube, disc, phaj | OD 80 X T8 XL Lwm yam raws li customized | |
Ti sib | 2N8-4N | 4.15 | Tube, disc, phaj | OD 127 x ID 105 x L OD 219 x ID 194 x L OD 300 x ID 155 x L Lwm yam raws li customized | |
Zr Lub Hom Phiaj | 2N5-4N | 6.5 | Tube, disc, phaj | Lwm yam raws li customized | |
Al phiaj | 4N-5N | 2.8 | Tube, disc, phaj | ||
Kuv aim | 3N-4N | 8.9 | Tube, disc, phaj | ||
Cu phiaj (tooj liab) | 3N-4N5 | 8.92 | Tube, disc, phaj | ||
Cu phiaj ( tooj dag) | 3N-4N5 | 8.92 | Tube, disc, phaj | ||
Tau phiaj | 3N5-4N | 16.68 | Tube, disc, phaj | OD 146xID136x299.67 (3pcs) | |
Taw qhia
Hauv kev lag luam txheej, Nickel Chromium sputtering lub hom phiaj binary alloy lub hom phiaj thiab cov yeeb yaj kiab tau siv dav hauv cov yeeb yaj kiab ntxiv dag zog xws li hnav tsis kam, hnav txo, kub tsis kam thiab corrosion kuj, nrog rau qis-emissivity (low-E) iav, microelectronics, Sib nqus Nyob rau hauv high-end technology industries xws li cov ntaubntawv povthawj siv, semiconductor thiab nyias zaj duab xis kuj, cov txheej txheem kev kho cua sov ho cuam tshuam rau theem qauv thiab microstructure ntawm alloy.
Lub microstructure thiab microdomain muaj pes tsawg leeg ntawm Ni-Cr alloys rhiab heev rau cov txheej txheem kho cua sov. Hauv thaj tsam ntawm 1000-1200 degrees Celsius, cov ntsiab lus atomic ntawm Ni hauv BCC theem hloov ntawm 5 feem pua rau 30 feem pua. Txoj kev kho cua sov uas tsim nyog homogenization yog npaj kom tau txais cov txiaj ntsig zoo Ni-Cr alloy nrog cov qauv sib xws thiab muaj pes tsawg leeg. Thaum cov ntsiab lus atomic ntawm Ni lub ntsiab lus yog 20 feem pua -70 feem pua, qhov kev kho cua sov homogenization yog tsim los ntawm 1200-1300 degrees Celsius, thiab lub sij hawm homogenization annealing txawv nrog rau kev xaiv ntawm annealing kub, thiab txawv nyob rau hauv lub thaj tsam ntawm 2-24H. Raws li kev sib tsoo cascade kev sib tsoo thiab txoj kev Monte Carlo, qhov kev simulation tshwm sim ntawm kev sib cuam tshuam ntawm qhov xwm txheej ions thiab Ni-Cr alloy lub hom phiaj khoom nyob rau hauv ion beam sputtering qhia tau hais tias lub atomic nto energies ntawm Ni thiab Cr kuj nyob ze. , Cov muaj pes tsawg leeg ntawm cov khoom sputtering ntawm Ni-Cr alloy lub hom phiaj tsis sib txawv ntawm qhov muaj pes tsawg leeg ntawm lub hom phiaj, uas muaj txiaj ntsig zoo rau kev xaiv ntawm lub hom phiaj muaj pes tsawg leeg thiab kev tswj hwm ntawm cov yeeb yaj kiab muaj pes tsawg leeg.
Lub sij hawm homogenization annealing sib txawv nrog rau qhov kub thiab txias ntawm qhov sib txawv ntawm 2-24h. Feem ntau, nyob rau hauv lub premise ntawm kom ntseeg tau lub uniformity ntawm cov qauv thiab muaj pes tsawg leeg, lub siab dua lub tshav kub kev kho mob kub, lub luv luv lub sij hawm kho cua sov yuav tsum tau; Ntawm qhov tod tes, txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau txhawm rau ua Nichrome zaj duab xis muaj siab resistivity thiab tsis tshua muaj kub coefficient ntawm kuj. Nws muaj cov yam ntxwv ntawm siab rhiab heev coefficient thiab me me kub dependence, yog li nws yog feem ntau siv nyob rau hauv kev npaj ntawm nyias zaj duab xis kuj strain gauges.
Cim npe nrov: sputtering phiaj
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